1. He-Ne laser
2. Polarizer
3. λ/4 wave plate
4. Incident tube
5. Sample stage
6. Output tube
7. Analyzer
8. Photocell
Features
Ideal for demonstration
Polarization by reflection
Refractive index measurement
Introduction
This is a manually operated experimental demonstrator of ellipsometry. An input beam of random polarization is first transferred to a linearly polarized beam by passing through a polarizer, and is then transferred to an elliptically polarized beam by using a quarter-wave plate. As the beam is further incident on a sample film, the polarization status of the beam reflected from the film will be altered. Optical parameters such as the thickness and refractive index of the sample film can be calculated by analysis of the change in polarization. Through this system, students can gain a better understanding of the working principle of an ellipsometer and familiarize with the operation of the instrument.
The instruction manual contains comprehensive materials including experimental configurations, principles and step-by-step instructions. Please click Experiment Theory and Contents to find more information about this apparatus.
Specifications
Description | Specifications |
Thickness Measurement Range | 1 nm ~ 300 nm |
Range of Incident Angle | 30º ~ 90º , Error ≤ 0.1º |
Polarizer & Analyzer Intersection Angle | 0º ~ 180º |
Disk Angular Scale | 2º per scale |
Min. Reading of Vernier | 0.05º |
Optical Center Height | 152 mm |
Work Stage Diameter | Φ 50 mm |
Overall Dimensions | 730x230x290 mm |
Weight | Approximately 20 kg |
Part List
Description | Qty |
Ellipsometer Unit | 1 |
He-Ne Laser | 1 |
Photoelectric Amplifier | 1 |
Photo Cell | 1 |
Silica Film on Silicon Substrate | 1 |
Analysis Software CD | 1 |
Instruction Manual | 1 |
1. He-Ne laser
2. Polarizer
3. λ/4 wave plate
4. Incident tube
5. Sample stage
6. Output tube
7. Analyzer
8. Photocell